Modeling Pulse Energy Deposition for Heat Stress Prediction in Femtosecond 1030 nm Laser Marking of Glass
Abstract:
The integration of femtosecond lasers in the marking industry has revolutionized the way intricate designs and codes are inscribed on glass. This study focuses on the pulse energy deposition in femtosecond 1030 nm laser marking of glass and its correlation with heat stress, which is crucial for predicting and minimizing the risk of thermal stress-induced fractures. By understanding the energy deposition dynamics, we can optimize the laser marking process to ensure the integrity and longevity of glass components.
Introduction:
Laser marking machines utilizing femtosecond 1030 nm lasers have become prevalent for their ability to mark glass without causing surface damage. The ultra-short pulse duration allows for precise control over the energy deposition, leading to minimal heat affected zones (HAZ). However, the complex interplay between pulse energy, pulse duration, and material properties results in varying degrees of heat stress within the glass. This research aims to model the energy deposition process to predict and control the heat stress generated during the marking of glass with femtosecond lasers.
Materials and Methods:
Experiments were conducted using a femtosecond 1030 nm laser marking machine to inscribe various patterns on glass substrates. The pulse energy was varied to study its effect on heat stress. The heat stress was quantified using a combination of optical microscopy, Raman spectroscopy, and finite element analysis (FEA). A heat transfer model was developed to simulate the energy deposition and subsequent heat stress distribution within the glass.
Results:
The results indicated that the pulse energy deposition plays a critical role in the heat stress generation. At low pulse energies, the heat stress was minimal, but as the energy increased, the heat stress also increased, reaching a threshold where micro-cracks began to form. The FEA model was able to predict the heat stress distribution with high accuracy, allowing for the optimization of laser parameters to minimize stress.
Discussion:
The study highlights the importance of pulse energy control in femtosecond laser marking of glass. By adjusting the pulse energy, it is possible to control the heat stress within the glass, thereby reducing the risk of thermal damage. The FEA model provides a valuable tool for predicting heat stress, enabling the customization of laser marking parameters to suit specific glass types and marking requirements.
Conclusion:
This research provides a comprehensive understanding of the relationship between pulse energy deposition and heat stress in femtosecond 1030 nm laser marking of glass. The developed model can be used to predict heat stress, allowing for the optimization of laser marking processes to ensure the quality and durability of glass components. Further studies can explore the long-term stability of marked glass under various environmental conditions.
Keywords: Femtosecond Laser Marking, Glass, Heat Stress, Pulse Energy Deposition, Modeling
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